Wholesale CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier |Dives

Cobalt Chromium Tantalum

CoCrTa Alloy Sputtering Target High Mundity thin film Pvd Coating Custom made Featured Image

Description:

Categoria	Admisce Sutlering Target
Formulae chemica	CoCrTa
Compositio	Cobalt Chromium Tantalum
Puritas	99.9%，99.95%，99.99%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting
Available Location	L≤200mm，W≤200mm

Mitte ad nos inscriptio

Product Detail

Product Tags

Cobalt Chromium Tantalum putris clypeum fabricari per processum emittentem et vacuum liquefactionem.et formantur in scopum desideratum figura.Magnam habet puritatem et microstructuram homogeneam.Co-Cr-Ta solebat esse materiam criticam magneticae recordationis pro suis proprietatibus magneticis: altam coercitivam, sonum humilem proprietatem et quadratam optimam.

Dives Materias Speciales speciales in Fabrica Sputris Target et Cobaltum Chromium Tantalum Putris Materias producere potuit secundum determinationes Customers.Pro maiori, pete nobis.

Priora: CoCrMo Alloy Sputtering Target High purity thin film Pvd Coating Custom Made

Deinde: CoCrW Alloy Sputtering Target High purity thin film Pvd Coating Custom made