Welcome to our websites!

CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Iron Tantalum Zirconium

Description:

Categoria

Admisce Sutlering Target

Formulae chemica

CoFeTaZr

Compositio

Cobalt Iron Tantalum Zirconium

Puritas

99.9%,99.95%,99.99%

Figura

Plates,Column Targets,arc cathodes,Custom-made

Processus productionis

Vacuum Melting

Available Location

L≤200mm,W≤200mm


Product Detail

Product Tags

Cobaltum Ferrum Tantalum Zirconium putris clypeum fabricatum per vacuum liquescens.Hic processus productionis maioris constitutiones oxidationis efficaciter tueri potuit et microstructuram homogeneam, magnitudinem frumenti aequabilem et altam constantiam cinematographicorum depositarum.

Post tractationem caloris, signum PTF signanter emendari potuit, ideo saepe pro materia magnetica iacuit in perpendicularis magneticae memoriae stratis adhibita.

Dives Materias Speciales speciales in manufactura sputantis target et Cobaltum ferreum Tantalum Zirconium putris Materias producere potuit secundum determinationes Customers.Pro maiori, pete nobis.


  • Priora:
  • Deinde: