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Cral Alloy Sputtering Target High purity thin film PVD Coating Custom made

Chromium Aluminium

Description:

Categoria

Admisce Sutlering Target

Formulae chemica

CrAl

Compositio

Chromium Aluminium

Puritas

99.7%,99.9%,99.95%,99.99%

Figura

Plates,Column Targets,arc cathodes,Custom-made

Processus productionis

Vacuum Melting,PM

Available Location

L≤2000mm,W≤200mm


Product Detail

Product Tags

Chromium Aluminium putris fabricatio scuta his gradibus comprehendit:

1. Pulvis stridor et mixtio.

2. Hot isostatic urgeat curatio ut semi-perfectum products.

3. Machinatio chromium aluminium aspera stannum putris materiae ad scopum materiae aluminium obtinendum chromium mixturae putris.

Per depositionem processus scutorum putris CrAl durum Aluminium-Chrom-Nitrid (AlCrN) efficiens formatur.Haec coatingis duritiem et oxidationem altam ostendit resistentiae proprietates usque ad caliditatem caliditatem.Caedarii ad altam decurrunt pascuntur ad augendam fructibus ac qualitatem excitandam cum machinis CNC utentes.

Nostra propria AlCr scuta et possessiones

Cr-70Alad%

Cr-60Alad%

Cr-50Alad%

Puritas (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density.g/cm*3.

3.7

4.35

4.55

Gpluvia Magnitudo(µm)

100/50

100/50

100/50

Processus

HIP

HIP

HIP

Dives Materias Speciales speciales habet in Fabrica Putris Target et Aluminium Chromium putris Materias producere potuit secundum determinationes Customers.Producti nostri praestantissimae proprietates mechanicae, homogeneae structurae, superficies politae nullis segregationibus, poris et rimis.Pro maiori, pete nobis.


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