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CrSi Alloy Sputtering Target High purity thin film Pvd Coating Custom made

Chrome Silicon

Description:

Categoria

Admisce Sutlering Target

Formulae chemica

CrSi

Compositio

Chrome Pii

Puritas

99.9%,99.95%,99.99%

Figura

Plates,Column Targets,arc cathodes,Custom-made

Processus productionis

Vacuum Melting,PM

Available Location

L≤1000mm,W≤200mm


Product Detail

Product Tags

Fabricatio Chronii Pii Putris Targets his gradibus comprehenditur:
1.Vacuum liquefactum ex Siliconis et Chronio ad gradum antemnarum obtinendum.
2. Pulvis stridor, tis et evacuatio.
3.Hot isostatic urgeat curatio ut semi-perfectum products.
4.Machining aspera chromium-piicon mixtura putris scopo materia ad chromium-piiconium stannum salientis materiam obtinendam.

CrSi saepe adhibetur ut materia cinematographica alta resistentia, sustinet altam resistentiam, stabilitatem et frigiditatem resistentiae coefficiens.Chronium et Silicon plura augmenta silicida producere potuerunt sicut Cr3Si , Cr5Si3 , , CrSi , CrSi2.Processus productionis, compositionis et caloris curatio processus CrSi cinematographici magnopere afficit effectum suum.

Dives Materias Speciales speciales habet in fabricando target putris et producere potuit Chronicum Silicon Materias putris secundum Customers specificationes.Pro maiori, pete nobis.


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