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CuAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Aluminium Cuprum

Description:

Categoria

Admisce Sutlering Target

Formulae chemica

CuAl

Compositio

Aluminium Cuprum

Puritas

99.9%,99.95%,99.99%

Figura

Plates,Column Targets,arc cathodes,Custom-made

Processus productionis

Vacuum Melting

Available Location

L≤200mm,W≤200mm


Product Detail

Product Tags

Scopum aeris Aluminium putris perfectum est multis industriis et applicationibus, ob altissimam duritiem, distrahentem vim et leve pondus.Solet 1-3% contentus cupri et similes proprietates chemicae cum Aluminio habet.CuAl altas proprietates mechanicas, egregiam machinabilitatem, et idoneitatem summus temperaturas habet, ut materia apta perficiendi Aluminium offensionis possit esse.Princeps castitatis CuAl offensionis scopum putridum adhiberi potuit in latitudine camporum industrialium a semiconductore et electronicis componentibus functionis.

Dives Materias Speciales speciales habet in fabricando target putris et producere potuit materias cupreas aluminium putris secundum specificationes Customers.Producti nostri praestantissimae proprietates mechanicae, homogeneae structurae, superficies politae nullis segregationibus, poris et rimis.Pro maiori, pete nobis.


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