Wholesale NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier |Dives

Nickel Chromium Aluminium Silicon

NiCrAlSi Sputtering Target High purity thin film Pvd Coating Custom made Featured Image

Description:

Categoria	Admisce Sutlering Target
Formulae chemica	NiCrAlSi
Compositio	Nickel Chromium Aluminium Silicon
Puritas	99.5%，99.9%，99.95%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting
Available Location	L≤1500mm, W≤200mm

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Scopum NiCrAlSi Putris producit per Vacuum Liquefactum, Iaculans et Hot Curatio ut magni constantiam, denique frumenti magnitudinem et bonum effectum obtineat.

Ob eximiam altam resistentiam, bonam anti-corrosionem morum, caliditas resistentiae et solidabilitatis, Nickel Chromium Aluminium Silicon offensionis late adhibetur in multis applicationibus industrialibus, inclusa metallurgia, fabricatione mechanica, et adjumenta domestica.

Dives Materias Speciales speciales in Fabrica Sputris Target et Nickel Chromium Aluminium Pii Putris Materias producere potuit secundum determinationes Customers.Pro maiori, pete nobis.

Priora: NiCr Sputtering Target High Munditia Tenuis Film Pvd Coating Custom Made

Deinde: NiCrAlY Sputtering Target High purity thin film Pvd Coating Custom made