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AlSiCu Alloy Sputtering Target High purity thin film Pvd Coating Custom Made

Aluminium Silicon Copper

Description:

Categoria

Admisce Sutlering Target

Formulae chemica

AlSiCu

Compositio

Aluminium aeris

Puritas

99.9%,99.95%,99.99%

Figura

Plates,Column Targets,arc cathodes,Custom-made

Processus productionis

Vacuum Melting

Available Location

L≤2000mm,W≤200mm


Product Detail

Product Tags

Aluminium Pii stannum cupreum fabricatur mediante artificio vacui liquefactionis et deformationis.Magnam puritatem habet, microstructuram homogeneam et grani magnitudinem exquisitam et in multis applicationibus et industriarum adhibitis, inclusa PVD tunica, fornacem vacuam componentem, X radius scutorum putris.Est etiam materias efficiens in Circuitus magnae Scalae Integratae propter singularem complexionem notarum desiderabilium, incluso leve pondus, bonum conductivity scelerisque, duritiem, duritiem et corrosionis resistentiam.

Dives Materias Speciales speciales in manufactura scatentium Target et Aluminium Siliconis Aeris putris Materias producere potuit secundum determinationes Customers.Producti nostri praestantissimae proprietates mechanicae, homogeneae structurae, superficies politae nullis segregationibus, poris et rimis.Pro maiori, pete nobis.


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