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AlCu Sputtering Target High Munditia Tenuis Film PVD Coating Custom Made

Aluminium Copper

Description:

Categoria

Admisce Sutlering Target

Formulae chemica

AlCu

Compositio

Aluminium Copper

Puritas

99.9%,99.95%,99.99%

Figura

Plates,Column Targets,arc cathodes,Custom-made

Processus productionis

Vacuum Melting,PM

Available Location

L≤200mm,W≤200mm


Product Detail

Product Tags

Aluminium Scopae Cupreae putris numerus industriarum et applicationum perfectus est, ob altissimam duritiem, distrahentem vim et leve pondus.Solet 1-3% contentus cupri et similes proprietates chemicae cum Aluminio habet.AlCu altas proprietates mechanicas, egregiam machinabilitatem, et idoneitatem summus temperaturas habet, ut materia apta perficiendi Aluminium offensionis possit esse.Princeps castitatis AlCu stannum putris scopo adhiberi potuit in latitudine camporum industrialium a semiconductore et electronicis componentibus functionis.

Dives Materias Speciales speciales habet in Fabrica Putris Target et Aluminium Chromium putris Materias producere potuit secundum determinationes Customers.Producti nostri praestantes proprietates mechanicas, homogeneas structuras, superficiem politam nullis segregationibus, poris, vel rimas agunt.Pro maiori, pete nobis.


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